Die folgenden Begriffe wurden einbezogen:
Schein-Exposition, Schein-Befeldung, "sham exposure", 擬似ばく露
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2019,
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2019,
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2019,
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2019,
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2019,
Qin F, Shen T, Li J, Xu B, Chen Y, Zheng ZA, Zou D
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2019,
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2019,
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2019,
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2019,
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2019,
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2019,
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2019,
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2019,
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2019,
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2019,
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2019,
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2019,
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2019,
Kumar R, Deshmukh PS, Sharma S, Banerjee B
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2019,
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2019,
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2019,
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2019,
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2019,
Lew WZ, Feng SW, Lin CT, Huang HM
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2018,
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2018,
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2018,
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2018,
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2018,
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2018,
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2018,
Lin Q, Dong L, Xu Y, Di G
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2018,
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2018,
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2018,
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2018,
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2018,
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2018,
Hori T, Nedachi T, Suzuki H, Harakawa S
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2018,
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2018,
Li H, Lin L, Li L, Zhou L, Hao S, Zhang Y, Ding Z
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2018,
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2018,
Hanci H, Kerimoğlu G, Mercantepe T, Odaci E
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2018,
He F, Luo PF, Tang T, Zhang F, Fang H, Ji SZ, Sun Y, Wu GS, Pan BH, Huo ZB, Wang GY, Xia ZF
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2018,
He Y, Sun W, Leung PSW, Siu TYM, Ng KT
2018 IEEE International Symposium on Electromagnetic Compatibility and 2018 IEEE Asia-Pacific Symposium on Electromagnetic Compatibility (EMC/APEMC), Suntec City, Singapore. IEEE: S. 936-939; ISBN 978-1-5090-3955-5
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2018,
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