キーワード:
"electromagnetic field", "Elektromagnetisches Feld", EMF, 電磁界
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2016,
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IEEE Access 4: 7469 - 7478
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2016,
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Kim YM, Cho SE, Seo YK
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2016,
Randelli P, Menon A, Ragone V, Creo P, Alfieri Montrasio U, Perucca Orfei C, Banfi G, Cabitza P, Tettamanti G, Anastasia L
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2016,
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2016,
Koyama S, Narita E, Shimizu Y, Shiina T, Taki M, Shinohara N, Miyakoshi J
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Zhonghua Lao Dong Wei Sheng Zhi Ye Bing Za Zhi 34 (6): 447-451
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2016,
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J Craniofac Surg 27 (6): 1606-1608
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2016,
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Genet Mol Res 15 (3): 8800-
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2016,
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Int J Artif Organs 39 (6): 294-299
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2016,
Tamrin SH, Majedi FS, Tondar M, Sanati-Nezhad A, Hasani-Sadrabadi MM
Rev Physiol Biochem Pharmacol 171: 63-97
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2016,
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Appl Environ Microbiol 82 (20): 6233-6246
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2016,
Lay-Ekuakille A, Griffo G, Conversano F, Casciaro S, Massaro A, Bhateja V, Spano F
2016 IEEE International Symposium on Medical Measurements and Applications (MeMeA), Benevento, Italy. IEEE: pp. 1-6; ISBN 978-1-4673-9173-3
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2016,
Zanovello U, Zilberti L, Giordano D, Borsero M
2016 Conference on Precision Electromagnetic Measurements (CPEM 2016), Ottawa, ON. IEEE: pp. 1-2; ISBN 978-1-4673-9135-1
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2016,
Williams CF, Lloyd D, Lees J, Pirog A, Geroni GM, Pastre J, Kriegel V, Porch A
2016 IEEE MTT-S International Microwave Symposium (IMS), San Francisco, CA, USA. IEEE: pp. 1-4; ISBN 978-1-5090-0699-1
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IET Microwaves, Antennas & Propagation 10 (11): 1154-1158
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2016,
Kuznetsov KA, Miroshnik DB, Shckorbatov YG, Nikolov OT, Kolchigin NN
2016 9th International Kharkiv Symposium on Physics and Engineering of Microwaves, Millimeter and Submillimeter Waves (MSMW), Kharkiv, Ukraine. IEEE: pp. 1-3; ISBN 978-1-5090-2268-7
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2016,
Rosu G, Druta N, Baltag O
2016 International Conference on Communications (COMM), Bucharest. IEEE: pp. 503-508; ISBN 978-1-4673-8198-7
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2016,
Verrender A, Loughran SP, Dalecki A, McKenzie R, Croft RJ
Int J Radiat Biol: 1-8
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2016,
Buckus R, Strukcinskiene B, Raistenskis J, Stukas R
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2016,
Fu JP, Mo WC, Liu Y, Bartlett PF, He RQ
Protein Cell 7 (9): 624-637
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2016,
Peipei Y, Wei W, Zheng Q
2016 Asia-Pacific International Symposium on Electromagnetic Compatibility (APEMC), Shenzhen, China. IEEE: pp. 1168-1171; ISBN 978-1-4673-9494-9