General information
Exposure setup described in reference article: J.H.Lucas and M.J.Johnson, IEEE, San Antonio, Texas, April 24-26, (1984), pp. 157-160
周波数
|
60 Hz
|
タイプ
|
|
ばく露時間
|
continuous for 48 h
|
Additional information
|
electric field
|
ばく露の発生源/構造
|
|
チャンバの詳細
|
four chambers containing the eggs (final volume of 50 ml) were concurrently exposed to the individual and combined fields including a control
|
測定量 |
値 |
種別 |
Method |
Mass |
備考 |
電流密度
|
300 mA/m²
|
effective value
|
-
|
-
|
-
|
周波数
|
60 Hz
|
タイプ
|
|
ばく露時間
|
continuous for 48 h
|
Additional information
|
magnetic field
|
ばく露の発生源/構造
|
|
チャンバの詳細
|
four chambers containing the eggs (final volume of 50 ml) were concurrently exposed to the individual and combined fields including a control
|
測定量 |
値 |
種別 |
Method |
Mass |
備考 |
磁束密度
|
100 µT
|
effective value
|
-
|
-
|
-
|
周波数
|
60 Hz
|
タイプ
|
- electric field
- magnetic field
|
ばく露時間
|
continuous for 48 h
|
Additional information
|
electric and magnetic field
|
ばく露の発生源/構造
|
|
チャンバの詳細
|
four chambers containing the eggs (final volume of 50 ml) were concurrently exposed to the individual and combined fields including a control
|
測定量 |
値 |
種別 |
Method |
Mass |
備考 |
電流密度
|
300 mA/m²
|
effective value
|
-
|
-
|
-
|
磁束密度
|
100 µT
|
effective value
|
-
|
-
|
-
|