General information
The complete detail of the exposure apparatus, the signal profile, the exposure geometry and dosimetry have been described in [Schuderer et al., 2004].
周波数
|
935 MHz
|
タイプ
|
|
特性
|
|
ばく露時間
|
continuous for 24 h
|
Modulation type
|
pulsed
|
Repetition frequency
|
217 Hz
|
Additional information
|
GSM basic
|
ばく露の発生源/構造
|
|
チャンバの詳細
|
Two identical waveguide cavities were placed in a tissue culture incubator maintained at 37°C with a humidified atmosphere of 5% CO2 in air. They were randomly assigned for RF or sham exposure. Good exposure and environmental control was achieved using field sensors, air temperature sensors, and an optimised airflow system.
|
ばく露装置の詳細
|
Cells were seeded into 35-mm Petri dishes in 3 ml of growth medium 24 h before any treatment and were placed inside the waveguides one hour before exposure. A specially designed holder allowed eight 35-mm Petri dishes to be placed accurately inside each chamber.
|
Sham exposure
|
A sham exposure was conducted.
|
測定量 |
値 |
種別 |
Method |
Mass |
備考 |
SAR
|
2 W/kg
|
mean
|
-
|
-
|
-
|
周波数
|
935 MHz
|
タイプ
|
|
特性
|
|
ばく露時間
|
continuous for 24 h
|
Modulation type
|
pulsed
|
Repetition frequency
|
217 Hz
|
Additional information
|
GSM talk (random changes between GSM basic and GSM DTX)
|
ばく露の発生源/構造
|
|
Sham exposure
|
A sham exposure was conducted.
|
測定量 |
値 |
種別 |
Method |
Mass |
備考 |
SAR
|
2 W/kg
|
mean
|
-
|
-
|
-
|
周波数
|
935 MHz
|
タイプ
|
|
特性
|
|
ばく露時間
|
continuous for 24 h
|
ばく露の発生源/構造
|
|
Sham exposure
|
A sham exposure was conducted.
|
測定量 |
値 |
種別 |
Method |
Mass |
備考 |
SAR
|
2 W/kg
|
mean
|
-
|
-
|
-
|
Reference articles