この研究は、1800 MHzの高周波(RF)電磁界(EMF)ばく露が、ヒト免疫関連細胞でのフリーラジカル産生および/または熱ショックタンパク質(HSP70)の発現を引き起こすか否かを調べた。ヒトMono Mac 6およびK562細胞を用いた。ばく露にはいくつかのEMF信号を用いた。連続波、GSMのいくつかの典型的な変調:GSM-non DTX(話すだけ)、GSM-DTX(聞くだけ)、GSM-Talk(34%話す、66%聞く)である。SARレベルは、0.5、1.0、1.5、2.0 W / kgで実験した。細胞は、インキュベータ対照群、擬似ばく露群、RF EMFばく露群の他に、PMA、LPS、熱(40℃)処理群およびRF EMFばく露とのこれらとの共ばく露群を作成した。ばく露後にフリーラジカル放出を測定した。その結果、熱およびPMA処理は、擬似および/またはインキュベータ対照に比べ、Mono Mac 6細胞でのスーパーオキシドラジカルアニオンおよびROS産生の有意な増加を引き起こしたが、RF EMFばく露によるフリーラジカル産生の有意な変化はなかった;RF EMF + PMAまたはRF EMF + LPSの共ばく露後に、スーパーオキシドラジカルアニオン生成に対する追加の影響は検出されなかった;フリーラジカル産生の考えられる阻害剤としての熱ショックタンパク質の関与を明らかにするためにRF EMFばく露後のHSP70発現レベルを測定したが、有意な影響は検出されなかった、と報告している。
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To study whether 1800 MHz radiofrequency electromagnetic field exposure at nonthermal level causes production of free radicals and/or expression of heat shock proteins in exponentially growing human immune-relevant cell systems.
Heat shock proteins function as molecular chaperones to protect cells from stress by inhibiting free radical formation.
Free radical release was examined after exposure to incubator control, sham exposure, radiofrequency electromagnetic fields, PMA (to activate cells through the receptor-independent pathway), LPS (to study the receptor-dependent pathway), heat (40 or 42°C) or co-exposure conditions.
ばく露 | パラメータ |
---|---|
ばく露1:
1,800 MHz
Modulation type:
CW
ばく露時間:
continuous for 45 min
|
|
ばく露2:
1,800 MHz
Modulation type:
pulsed
ばく露時間:
continuous for 45 min
GSM-nonDTX
|
|
ばく露3:
1,800 MHz
Modulation type:
pulsed
|
|
ばく露4:
1,800 MHz
Modulation type:
pulsed
ばく露時間:
continuous for 45 min
|
Cells were treated concurrently in the same incubator as follows: (1) non-treated (incubator control), (2) sham exposed, (3) RF EMF exposed, (4) sham exposed + 1 µg/ml LPS or 1 µM PMA, (5) co-exposed to RF EMF + LPS or PMA, or (6) exposed to heat (40°C or 42°C) in a separate incubator. Exposures to different SARs or signal-modulated conditions were performed separately. All experiments were carried out for 45 min at 37°C (except for the heat experiment) in a humidified atmosphere of 5% CO2 in air.
周波数 | 1,800 MHz |
---|---|
タイプ |
|
特性 |
|
ばく露時間 | continuous for 45 min |
Modulation type | CW |
---|
ばく露の発生源/構造 | |
---|---|
チャンバの詳細 | The exposure setup (see reference article) consisted of two single-mode resonator cavities that were placed within the CO2 incubator. Each waveguide was equipped with a fan and monopole field sensors. |
ばく露装置の詳細 | Six 35-mm Petri dishes were exposed in one waveguide, and a dish holder ensured the correct placement of the dishes in the H-field maxima of the standing waves inside the cavity. |
Sham exposure | A sham exposure was conducted. |
Additional information | Exposure and sham conditions were blindly assigned to the two waveguides by the computer-controlled signal unit. Field strengths, air temperatures, fan driving currents and all commands were continuously logged. During exposure, the temperature difference between sham and field exposed cultures never exceeded 0.3°C. As shown by numerical simulation, the possibility of temperature hot spots can be excluded. |
周波数 | 1,800 MHz |
---|---|
タイプ |
|
特性 |
|
ばく露時間 | continuous for 45 min |
Additional information | GSM-nonDTX |
ばく露の発生源/構造 |
|
---|---|
Sham exposure | A sham exposure was conducted. |
Modulation type | pulsed |
---|---|
Pulse width | 0.576 ms |
Duty cycle | 12.5 % |
Repetition frequency | 217 Hz |
Pulse type | rectangular |
Additional information |
GSM-DTX (hearing only): Is activated during periods of not speaking into the phone. The transmission is reduced to 12 active frames per 104 frames, leading to a crest factor of 69. The frame structure results in 2, 8 and 217 Hz components. |
ばく露の発生源/構造 |
|
---|---|
Sham exposure | A sham exposure was conducted. |
周波数 | 1,800 MHz |
---|---|
タイプ |
|
特性 |
|
ばく露時間 | continuous for 45 min |
Additional information | GSM-Talk |
Modulation type | pulsed |
---|---|
Pulse width | 0.576 ms |
Duty cycle | 12.5 % |
Repetition frequency | 217 Hz |
Pulse type | rectangular |
Additional information |
GSM-Talk (34% speaking and 66% hearing): Simulates a conversation and generates temporal changes between 11 s of GSM-nonDTX and 6 s of GSM-DTX (average durations). The crest factor is 11.9. |
ばく露の発生源/構造 |
|
---|---|
Sham exposure | A sham exposure was conducted. |
Heat and PMA treatment induced a significant increase in superoxide radical anions and in reactive oxygen species production in the Mono Mac 6 cells when compared to sham exposure and/or incubator conditions.
In Mono Mac 6 cells or K562 cells no significant differences in free radical production were found after radiofrequency electromagnetic field exposure or in the respective controls. No additional effects on superoxide radical anion production were revealed after co-exposure to "radiofrequency electromagnetic fields+PMA" or "radiofrequency electromagnetic fields+LPS".
No significant effects were detected in HSP70 expression levels after different radiofrequency electromagnetic field exposures.
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