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21912件の論文が見つかりました。

キーワード: exposure, Exposition, ばく露

• 2021, Castellanos MR, Ying D, Love DJ, Peleato B, Hochwald BM
  [レイリーフェージングMIMOチャネル用の動的な電磁界ばく露の割り当て] [tech./dosim.]
  IEEE Trans Wirel Commun 20 (2): 728-740
• 2021, Brzozek C, Zeleke BM, Abramson MJ, Benke KK, Benke G
  [無線周波電磁界ばく露評価：携帯電話の信号強度及び送信電力レベルについてのパイロット研究] [tech./dosim.]
  J Expo Sci Environ Epidemiol 31 (1): 62-69
• 2021, Wilden S, Friis M, Tuettenberg A, Staubach-Renz P, Wegner J, Grabbe S, von Stebut E
  [強いパルス光と無線周波を用いた化膿性汗腺炎の併用治療] [med. app.]
  J Dermatolog Treat 32 (5): 530-537
• 2021, Hosseini M, Farhang Matin L, Monazzam MR, Khosroabadi H
  [変電所での労働者のばく露に対する磁界を生じる装置の内部レイアウトの役割の調査] [tech./dosim.]
  Int J Occup Saf Ergon 27 (1): 1-7
• 2021, Tuncal S, Onalan AK, Aydogan F, Unsal V, Yumusak N, Buyukatalay E, Ozturk G, Seyhan N, Celepli S, Devrim E, Kilicoglu B
  [甲状腺組織に対する2100 MHz無線周波電磁放射の影響] [med./bio.]
  West Indian Med J 69 (1): 51-55
• 2021, Perret D, Kim DS, Li KW, Luo ZD
  [末梢神経損傷による神経因性疼痛モデルにおける脊髄後根神経節のパルス無線周波電流へのばく露] [med./bio.]
  Luo ZD (ed.): Pain Research. Methods in Molecular Biology, 851巻; Humana Press, Totowa; pp. 275-284; ISBN 978-1-61779-560-2
• 2020, Leidecker-Sandmann S, Kohler S, Osterheider A, Niemann P, Lehmkuhl M
  [Review of presentation formats for measurement results of low-frequency fields and their significance for risk communication - Project 3618S82452] [info]
  Federal Office for Radiation Protection (BfS), Ressortforschungsberichte zum Strahlenschutz, BfS-RESFOR-160/20: 1-84
• 2020, Shuai C, Yang W, He C, Peng S, Gao C, Yang Y, Qi F, Feng P
  A magnetic micro-environment in scaffolds for stimulating bone regeneration [med./bio.]
  Mater Des 185: 108275
• 2020, Evtina AA, Buldakov MA, Priputnev PV, Romanchenko IV, Cherdyntseva NV, Zharkova LP, Bolshakov MA, Rostov VV
  Different Sensitivity of Normal and Tumor Cells to Pulsed Radiofrequency Exposure [med./bio.]
  2020 7th International Congress on Energy Fluxes and Radiation Effects (EFRE), Tomsk, Russia. IEEE: pp. 118-122; ISBN 978-1-7281-2687-6
• 2020, Yang KW, Oh K, Ha S
  Challenges in Scaling Down of Free-Floating Implantable Neural Interfaces to Millimeter Scale [basics]
  IEEE Access 8: 133295-133320