この研究は、前腫瘍性CL-S1乳腺上皮細胞のインビトロでの増殖に対するナノパルス電磁界（強度は低から中程度）の長期ばく露の影響を調べた。細胞はコミトゲンとして10 ng/ ml のEGFおよび10 μg/ mlのインスリンを含む無血清規定培地で増殖・維持された。ナノパルス電磁界の電界強度は18 kV/ m、パルス繰り返し周波数1 kHz、パルス幅10 nsであり、ばく露時間は0.25 - 3.0時間の短時間ばく露および4 - 6 時間の長時間ばく露を行なった。その後72時間培養した。その結果、ナノパルスの短時間ばく露の場合、その後の72時間培養中のCL-S1細胞の増殖または生存率に影響は見られなかった；ナノパルスの長時間ばく露の場合、無処理対照と比較して、細胞増殖が有意に増加した；追加の実験として、EGFのみを含む培地で細胞を維持した場合、ナノパルスばく露によりCL-S1細胞の増殖が促進されたが、マイトジェンを含まない、またはインスリンのみを含む規定培地で維持された細胞では影響がなかったことが示された、などの知見を報告している。
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To study the effects of prolonged exposure to non-ionizing, low to moderate intensity nanopulses on the growth of pre-neoplastic CL-S1 mammary epithelial cells in vitro. Additional studies investigated the effects of nanopulse exposure on the activation of the mitogen-activated protein kinase (MAPK) mitogenic signalling pathway in these cells.
Electromagnetic ultra-wideband pulses or nanopulses, are generated by a wide range of electronic devices used in communications, radar technology, and high-powered microwave weapons.
Cells were grown in culture medium containing 10 ng/ml EGF (epidermal growth factor) and 10 µg/ml insulin as co-mitogens.
All experiments were repeated at least three times.
| Modulation type | pulsed |
|---|---|
| Pulse width | 10 ns |
| Rise time | 0.1 ns |
| Repetition frequency | 1,000 kHz |
| Additional information |
Pulse repetition rates tested were 1, 10, 100 and 1000 kHz. |
| ばく露の発生源／構造 | |
|---|---|
| チャンバの詳細 | The exposure setup was installed in a copper plate shielded room with an attenuation of 85 dB at 10 GHz. Ancillary equipment was located in a second copper mesh shielded room. |
| ばく露装置の詳細 | Biological samples were placed in the temperature-controlled (27 °C) gigahertz transverse electromagnetic mode (GTEM) cell and exposed to nanopulses of defined properties. These pulses are non-ionizing and do not cause sample heating. |
| Sham exposure | A sham exposure was conducted. |
| 測定量 | 値 | 種別 | Method | Mass | 備考 |
|---|---|---|---|---|---|
| 電界強度 | 18 kV/m | - | - | - | - |
| Modulation type | pulsed |
|---|---|
| Pulse width | 10 ns |
| Rise time | 0.1 ns |
| Repetition frequency | 1,000 kHz |
| Additional information |
Pulse repetition rates tested were 1, 10, 100 and 1000 kHz. |
| ばく露の発生源／構造 |
|
|---|---|
| Sham exposure | A sham exposure was conducted. |
| Modulation type | pulsed |
|---|---|
| Pulse width | 10 ns |
| Rise time | 0.1 ns |
| Repetition frequency | 1 kHz |
| ばく露の発生源／構造 |
|
|---|---|
| Sham exposure | A sham exposure was conducted. |
| 測定量 | 値 | 種別 | Method | Mass | 備考 |
|---|---|---|---|---|---|
| 電界強度 | 18 kV/m | - | - | - | - |
The data showed that 0.25-3.0 h exposure to nanopulses (18 kV/m field intensity, 1 kHz repetition rate, 10 ns pulse width) had no effect on cell growth or cell viability during the subsequent 72-h culture period. However, exposure to similar nanopulses for prolonged periods of time (4-6 h) resulted in a significant increase in cell proliferation, as compared to untreated controls.
Nanopulse exposure enhanced cell growth when cells were maintained in media containing only EGF, but had no effect on cells maintained in defined media that were mitogen-free or containing only insulin.
The findings also revealed that the growth-promoting effects of nanopulse exposure were associated with a relatively large increase in intracellular levels of phospho-MEK1 and phospho-ERK1/2 in these cells.
These results demonstrate that prolonged exposure to moderate levels of ultra-wideband pulses enhanced EGF-dependent mitogenesis, and that this growth-promoting effect appears to be mediated by enhanced activation of the mitogen-activated protein kinase signalling pathway in these cells.
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