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3127件の論文が見つかりました。

キーワード: 職業ばく露, "berufliche Exposition", "occupational exposure"

• 2022, Salehi SH, Sadat Azad Y, Bagheri T, Ghadimi T, Rahbar A, Ehyaei P, Momeni M
  [職業的電撃傷の疫学] [elec. inj.]
  J Burn Care Res 43 (2): 399-402
• 2022, Xiao H, Liu R, Liu X, Wang H, Cen Y, Xu X
  [電撃傷後の重度の頸部瘢痕拘縮の再建] [med. app.]
  J Craniofac Surg 33 (1): 203-205
• 2022, Jabehdar Maralani P, Kapadia A, Liu G, Moretti F, Ghandehari H, Clarke SE, Wiebe S, Garel J, Ertl-Wagner B, Hurrell C, Schieda N
  [妊娠中のMRIの安全な使用に関するカナダ放射線科医協会の推奨事項] [basics]
  Can Assoc Radiol J 73 (1): 56-67
• 2022, Sandhu A, Herron JBT, Martin NA
  [軍事的および人道的状況での火傷管理] [basics]
  BMJ Mil Health 168 (6): 467–472
• 2022, Hartwig V, Biagini C, De Marchi D, Flori A, Gabellieri C, Virgili G, Ferrante Vero LF, Landini L, Vanello N, Giovannetti G
  [3-TのMRIサイトにおける静磁界への職業的ばく露の分析、比較および表現] [tech./dosim.]
  Int J Occup Saf Ergon 28 (1): 76-85
• 2021, Korolev IV, Shcherbacheva OS, Zvonkova NV, Zavyalova AA, Zakrevsky AA
  Improving Safety of Works under Induced Voltage Taking Into Account the Asymmetric Operation Mode of the Influencing Line [tech./dosim.]
  2021 3rd International Youth Conference on Radio Electronics, Electrical and Power Engineering (REEPE), Moscow, Russia. IEEE: pp. 1-4; ISBN 978-1-7281-8399-2
• 2021, EMF-Institut (Fachinstitut für Elektromagnetische Verträglichkeit zur Umwelt), Nießen P
  [Expert report on the determination of the exposure to high-frequency electromagnetic fields by WLAN networks in the 2.4 GHz and 5 GHz range] [info]
  1-28
• 2021, Fontgalland G, de Andrade HD, de Figueiredo AL, de S. Queiroz IJr, De Oliveira AHS, Paiva JLS, Sousa MET
  Estimation of electric and magnetic fields in a 230 kV electrical substation using spatial interpolation techniques [tech./dosim.]
  IET Sci Meas Technol 15 (4): 411-418
• 2021, Souques M, Duburcq A, Bureau I, Courouve L, Babin C, Magne I, Cabanes PA
  Cohort of retirees from the French Electricity Transmission Network (RTE: Reseau de Transport d'Electricite) occupationally exposed to 50 Hz magnetic fields. A protocol and results of the first wave of inclusion [epidem.]
  Environnement, Risques & Santé 20 (1): 22-+
• 2021, Chan G, Lee CC, Wei Y, Tsang KF
  A Review of Compliance Design for Semiconductor Fabrication Equipment [basics]
  2021 IEEE International Symposium on Product Compliance Engineering - Asia (ISPCE-ASIA), Taipei, Taiwan. IEEE: pp. 01-06; ISBN 978-1-6654-4343-2