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287件の論文が見つかりました。

キーワード: 炭素, Kohlenstoff, carbon

• 2020, Mao Z, Zhang Y, Lu N, Cheng S, Hong R, Liu QH
  [カーボンナノチューブが可能にするカルシウム処理の擾乱を通じた低強度ナノ秒電気パルスによる高効率細胞アポトーシス] [med./bio.]
  Small 16 (1): e1904047
• 2020, Tatlıparmak A, Aksoy B, Shishehgarkhaneh LR, Gökdemir G, Koç E
  [にきび瘢痕の治療用のフラクショナル二酸化炭素レーザー及びフラクショナルマイクロニードル無線周波の併用：にきびの重症度及び患者の満足度に対する1か月間の治療のアウトカムの後ろ向き分析] [med. app.]
  J Cosmet Dermatol 19 (1): 115-121
• 2019, Baltušnikaitė-Guzaitienė J, Varnaitė-Žuravliova S
  Textile Based Shielding Materials [basics]
  Jaroszewski M, Thomas S, Rane AV (eds.): Advanced Materials for Electromagnetic Shielding: Fundamentals, Properties, and Applications. John Wiley & Sons, Inc.; pp. 219-239; ISBN 978-1-119-12861-8
• 2019, Inaniwa T, Suzuki M, Sato S, Noda A, Muramatsu M, Iwata Y, Kanematsu N, Shirai T, Noda K
  Influence of a perpendicular magnetic field on biological effectiveness of carbon-ion beams [med./bio.]
  Int J Radiat Biol 95 (9): 1346-1350
• 2019, Bubanja IN, Lončarević B, Lješević M, Beškoski V, Gojgić-Cvijović G, Velikić Z, Stanisavljev D
  The influence of low-frequency magnetic field regions on the Saccharomyces cerevisiae respiration and growth [med./bio.]
  Chem Eng Process - Process Intensif 143: 107593
• 2019, Yudhistiara B, Weber KJ, Huber PE, Ruehle A, Brons S, Haering P, Debus J, Hauswald H
  Carbon ion and proton beam irradiation of a normal human TK6 lymphoblastoid cell line within a magnetic field of 1.0 tesla [med./bio.]
  Cancer Manag Res 11: 8327-8335
• 2019, Mi Y, Liu Q, Li P, Xu J
  [ナノ秒パルス化電界下での細胞電気穿孔のカーボンナノチューブベースの強化のシミュレーション] [tech./dosim.]
  Biomed Res Int 2019: 9654583
• 2019, Sang M, Wang S, Liu S, Liu M, Bai L, Jiang W, Xuan S, Gong X
  [人体のモニタリングおよび防護のための疎水性、自己給電、電磁遮へいのPVDFベースのウェアラブルデバイス] [tech./dosim.]
  ACS Appl Mater Interfaces 11 (50): 47340-47349
• 2019, Hoss E, Kollipara R, Fabi S
  [非侵襲的な膣の若返り：無線周波デバイス] [basics]
  Skinmed 17 (6): 396-398
• 2019, Shoaib N, Zaidi SNF, Shafqat A, Cheema HM
  [スポーツ用ウェアラブル小型生体機械のEMC/I［電磁両立性／電磁障害］分析] [tech./dosim.]
  2019 12th International Workshop on the Electromagnetic Compatibility of Integrated Circuits (EMC Compo), Hangzhou, China. IEEE: pp. 210-212; ISBN 978-1-7281-4263-0