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86件の論文が見つかりました。

キーワード: "risk management", Risikomanagement

• 2023
  An Introduction to Non-Ionizing Radiation [basics]
  Maqbool M (ed.): Bentham Science Publisher, Singapore; ISBN 978-981-5136-90-6
• 2023, Askari A, Poursadeghiyan M, Alinia A, Sephvand A, Jafarzadeh E, Nasl-Saraji G, Sahlabadi AS
  [有害物質リスク優先度指数（HARPI）に基づく北アザデガン油田における職場のリスク因子の評価] [basics]
  Iran J Public Health 52 (10): 2157-2168
• 2023, D’Agostino S, Colella M, Falsaperla R, Liberti M, Apollonio F
  [経頭蓋磁気刺激療法からのばく露における男性と女性の施術者間に生じ得る差異] [tech./dosim.]
  2023 XXXVth General Assembly and Scientific Symposium of the International Union of Radio Science (URSI GASS), Sapporo, Japan. IEEE: pp. 1-4; ISBN 9798350309973
• 2023, Archana
  [消費者の信念と不安を理解する：スマートメーター設置の事例] [risk]
  Int J RF Technol-Res Appl 13 (1): 1-20
• 2023, Almalty AR, Abdelnour HM, Hawamdeh M, Alkhob SA
  [短波ジアテルミーの禁忌に対する理学療法士の理解：アンケート調査] [basics]
  Risk Manag Healthc Policy 16: 1171-1185
• 2023, Bonato M, Chiaramello E, Parazzini M, Gajšek P, Ravazzani P
  [詳細] [超低周波電界および磁界ばく露：最近の知見の調査] [review]
  IEEE J Electromagn RF Microw Med Biol 7 (3): 216-228
• 2022, Ikehata M
  Trend of Health Risk Management of Electromagnetic Field in Light of the New Era with the New Generation of Mobile Communication Technology [basics]
  Japanese Railway Engineering No.217: 19-21
• 2022, Petroulakis N, Chatziadam P, Mattsson MO, Simko M, Theodorou V, Yiorkas AM, Gavrielides A, Miaoudakis A, Scarfi MR, Zeni O
  [次世代高周波電磁界ばく露および健康データへのアクセスのためのNetGEMイノベーションおよび知識のハブ（NIKH）のデザイン] [basics]
  2022 IEEE Conference on Standards for Communications and Networking (CSCN), Thessaloniki, Greece. IEEE: pp. 42-47; ISBN 978-1-6654-7622-5
• 2022, Antal A, Luber B, Brem AK, Bikson M, Brunoni AR, Cohen Kadosh R, Dubljević V, Fecteau S, Ferreri F, Flöel A, Hallett M, Hamilton RH, Herrmann CS, Lavidor M, Loo C, Lustenberger C, Machado S, Miniussi C, Moliadze V, Nitsche MA, Rossi S, Rossini PM, Santarnecchi E, Seeck M, Thut G, Turi Z, Ugawa Y, Venkatasubramanian G, Wenderoth N, Wexler A, Ziemann U, Paulus W
  [非侵襲的脳刺激と神経増強] [review]
  Clin Neurophysiol Pract 7: 146-165
• 2021, Chan G, Lee CC, Wei Y, Tsang KF
  A Review of Compliance Design for Semiconductor Fabrication Equipment [basics]
  2021 IEEE International Symposium on Product Compliance Engineering - Asia (ISPCE-ASIA), Taipei, Taiwan. IEEE: pp. 01-06; ISBN 978-1-6654-4343-2